Self‐Assembled Si Quantum‐Ring Structures on a Si Substrate by Plasma‐Enhanced Chemical Vapor Deposition Based on a Growth‐Etching Competition Mechanism
- DOI
- 10.1002/adma.200602804
- Published
- 2007-05-23
- Container
- Advanced Materials
- Publisher
- Wiley
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1002/adma.200602804,
title = {Self‐Assembled Si Quantum‐Ring Structures on a Si Substrate by Plasma‐Enhanced Chemical Vapor Deposition Based on a Growth‐Etching Competition Mechanism},
author = {L. W. Yu and K. J. Chen and J. Song and J. Xu and W. Li and H. M. Li and M. Wang and X. F. Li and X. F. Huang},
year = {2007},
journal = {Advanced Materials},
doi = {10.1002/adma.200602804},
url = {https://doi.org/10.1002/adma.200602804}
}RIS
TY - JOUR TI - Self‐Assembled Si Quantum‐Ring Structures on a Si Substrate by Plasma‐Enhanced Chemical Vapor Deposition Based on a Growth‐Etching Competition Mechanism AU - L. W. Yu AU - K. J. Chen AU - J. Song AU - J. Xu AU - W. Li AU - H. M. Li AU - M. Wang AU - X. F. Li AU - X. F. Huang PY - 2007 JO - Advanced Materials DO - 10.1002/adma.200602804 UR - https://doi.org/10.1002/adma.200602804 ER -
APA
Yu, L. W., Chen, K. J., Song, J., Xu, J., Li, W., Li, H. M., Wang, M., Li, X. F., & Huang, X. F. (2007). Self‐Assembled Si Quantum‐Ring Structures on a Si Substrate by Plasma‐Enhanced Chemical Vapor Deposition Based on a Growth‐Etching Competition Mechanism. Advanced Materials. https://doi.org/10.1002/adma.200602804
Source records
- crossref · retrieved 2026-09-24T19:44:46.767Z