Self‐Assembled Si Quantum‐Ring Structures on a Si Substrate by Plasma‐Enhanced Chemical Vapor Deposition Based on a Growth‐Etching Competition Mechanism

L. W. Yu, K. J. Chen, J. Song, J. Xu, W. Li, H. M. Li, M. Wang, X. F. Li, X. F. Huang

Open source

DOI
10.1002/adma.200602804
Published
2007-05-23
Container
Advanced Materials
Publisher
Wiley
Open access
unknown

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BibTeX

@article{allodium:10.1002/adma.200602804,
  title = {Self‐Assembled Si Quantum‐Ring Structures on a Si Substrate by Plasma‐Enhanced Chemical Vapor Deposition Based on a Growth‐Etching Competition Mechanism},
  author = {L. W. Yu and K. J. Chen and J. Song and J. Xu and W. Li and H. M. Li and M. Wang and X. F. Li and X. F. Huang},
  year = {2007},
  journal = {Advanced Materials},
  doi = {10.1002/adma.200602804},
  url = {https://doi.org/10.1002/adma.200602804}
}

RIS

TY  - JOUR
TI  - Self‐Assembled Si Quantum‐Ring Structures on a Si Substrate by Plasma‐Enhanced Chemical Vapor Deposition Based on a Growth‐Etching Competition Mechanism
AU  - L. W. Yu
AU  - K. J. Chen
AU  - J. Song
AU  - J. Xu
AU  - W. Li
AU  - H. M. Li
AU  - M. Wang
AU  - X. F. Li
AU  - X. F. Huang
PY  - 2007
JO  - Advanced Materials
DO  - 10.1002/adma.200602804
UR  - https://doi.org/10.1002/adma.200602804
ER  - 

APA

Yu, L. W., Chen, K. J., Song, J., Xu, J., Li, W., Li, H. M., Wang, M., Li, X. F., & Huang, X. F. (2007). Self‐Assembled Si Quantum‐Ring Structures on a Si Substrate by Plasma‐Enhanced Chemical Vapor Deposition Based on a Growth‐Etching Competition Mechanism. Advanced Materials. https://doi.org/10.1002/adma.200602804

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