Adaptive Epitaxy of C‐Si‐Ge‐Sn: Customizable Bulk and Quantum Structures
- DOI
- 10.1002/adma.202506919
- Published
- 2025-06-11
- Container
- Advanced Materials
- Publisher
- Wiley
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1002/adma.202506919,
title = {Adaptive Epitaxy of C‐Si‐Ge‐Sn: Customizable Bulk and Quantum Structures},
author = {Omar Concepción and Ambrishkumar J. Devaiya and Marvin H. Zoellner and Markus A. Schubert and Florian Bärwolf and Lukas Seidel and Vincent Reboud and Andreas T. Tiedemann and Jin‐Hee Bae and Alexei Tchelnokov and Qing‐Tai Zhao and Christopher A. Broderick and Michael Oehme and Giovanni Capellini and Detlev Grützmacher and Dan Buca},
year = {2025},
journal = {Advanced Materials},
doi = {10.1002/adma.202506919},
url = {https://doi.org/10.1002/adma.202506919}
}RIS
TY - JOUR TI - Adaptive Epitaxy of C‐Si‐Ge‐Sn: Customizable Bulk and Quantum Structures AU - Omar Concepción AU - Ambrishkumar J. Devaiya AU - Marvin H. Zoellner AU - Markus A. Schubert AU - Florian Bärwolf AU - Lukas Seidel AU - Vincent Reboud AU - Andreas T. Tiedemann AU - Jin‐Hee Bae AU - Alexei Tchelnokov AU - Qing‐Tai Zhao AU - Christopher A. Broderick AU - Michael Oehme AU - Giovanni Capellini AU - Detlev Grützmacher AU - Dan Buca PY - 2025 JO - Advanced Materials DO - 10.1002/adma.202506919 UR - https://doi.org/10.1002/adma.202506919 ER -
APA
Concepción, O., Devaiya, A. J., Zoellner, M. H., Schubert, M. A., Bärwolf, F., Seidel, L., Reboud, V., Tiedemann, A. T., Bae, J., Tchelnokov, A., Zhao, Q., Broderick, C. A., Oehme, M., Capellini, G., Grützmacher, D., & Buca, D. (2025). Adaptive Epitaxy of C‐Si‐Ge‐Sn: Customizable Bulk and Quantum Structures. Advanced Materials. https://doi.org/10.1002/adma.202506919
Source records
- crossref · retrieved 2026-09-25T23:00:59.662Z