Advancing the Frontiers of HfO(2)-Based Ferroelectric Memories: Innovative Concepts from Materials to Applications.

Zhou Z, Li L, Feng Y, Wang X, Zheng Z, Jiao L, Zheng H, Shi Y, Ang KW, Gong X

Open source

DOI
10.1002/adma.202509525
Published
2025 Dec
Container
Advanced materials (Deerfield Beach, Fla.)
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.1002/adma.202509525,
  title = {Advancing the Frontiers of HfO(2)-Based Ferroelectric Memories: Innovative Concepts from Materials to Applications.},
  author = {Zhou Z and Li L and Feng Y and Wang X and Zheng Z and Jiao L and Zheng H and Shi Y and Ang KW and Gong X},
  year = {2025},
  journal = {Advanced materials (Deerfield Beach, Fla.)},
  doi = {10.1002/adma.202509525},
  url = {https://doi.org/10.1002/adma.202509525}
}

RIS

TY  - JOUR
TI  - Advancing the Frontiers of HfO(2)-Based Ferroelectric Memories: Innovative Concepts from Materials to Applications.
AU  - Zhou Z
AU  - Li L
AU  - Feng Y
AU  - Wang X
AU  - Zheng Z
AU  - Jiao L
AU  - Zheng H
AU  - Shi Y
AU  - Ang KW
AU  - Gong X
PY  - 2025
JO  - Advanced materials (Deerfield Beach, Fla.)
DO  - 10.1002/adma.202509525
UR  - https://doi.org/10.1002/adma.202509525
ER  - 

APA

Z, Z., L, L., Y, F., X, W., Z, Z., L, J., H, Z., Y, S., KW, A., & X, G. (2025). Advancing the Frontiers of HfO(2)-Based Ferroelectric Memories: Innovative Concepts from Materials to Applications.. Advanced materials (Deerfield Beach, Fla.). https://doi.org/10.1002/adma.202509525

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