Effect of Atomic Layer Deposition of Ultra-Thin Oxide on Reactivity and Durability of Perovskite Oxygen Electrodes.

Seo J, Jeon S, Kim H, Kwak S, Oh D, Koo B, Kim J, Kim JH, Jung W

Open source

DOI
10.1002/adma.202513655
Published
2026 Jun
Container
Advanced materials (Deerfield Beach, Fla.)
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.1002/adma.202513655,
  title = {Effect of Atomic Layer Deposition of Ultra-Thin Oxide on Reactivity and Durability of Perovskite Oxygen Electrodes.},
  author = {Seo J and Jeon S and Kim H and Kwak S and Oh D and Koo B and Kim J and Kim JH and Jung W},
  year = {2026},
  journal = {Advanced materials (Deerfield Beach, Fla.)},
  doi = {10.1002/adma.202513655},
  url = {https://doi.org/10.1002/adma.202513655}
}

RIS

TY  - JOUR
TI  - Effect of Atomic Layer Deposition of Ultra-Thin Oxide on Reactivity and Durability of Perovskite Oxygen Electrodes.
AU  - Seo J
AU  - Jeon S
AU  - Kim H
AU  - Kwak S
AU  - Oh D
AU  - Koo B
AU  - Kim J
AU  - Kim JH
AU  - Jung W
PY  - 2026
JO  - Advanced materials (Deerfield Beach, Fla.)
DO  - 10.1002/adma.202513655
UR  - https://doi.org/10.1002/adma.202513655
ER  - 

APA

J, S., S, J., H, K., S, K., D, O., B, K., J, K., JH, K., & W, J. (2026). Effect of Atomic Layer Deposition of Ultra-Thin Oxide on Reactivity and Durability of Perovskite Oxygen Electrodes.. Advanced materials (Deerfield Beach, Fla.). https://doi.org/10.1002/adma.202513655

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