High Photostrictive Strain Rate in Ferroelectric AlScN Thin Films
- DOI
- 10.1002/adma.202519418
- Published
- 2025-12-29
- Container
- Advanced Materials
- Publisher
- Wiley
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1002/adma.202519418,
title = {High Photostrictive Strain Rate in Ferroelectric AlScN Thin Films},
author = {Hui Li and Shashidhara Acharya and Jin Kyu Han and Ming Sheng Zhang and Pooi See Lee and Jingcong Hu and David Boon Kiang Lim and Percis Teena Christopher Subhodayam and Kui Yao},
year = {2025},
journal = {Advanced Materials},
doi = {10.1002/adma.202519418},
url = {https://doi.org/10.1002/adma.202519418}
}RIS
TY - JOUR TI - High Photostrictive Strain Rate in Ferroelectric AlScN Thin Films AU - Hui Li AU - Shashidhara Acharya AU - Jin Kyu Han AU - Ming Sheng Zhang AU - Pooi See Lee AU - Jingcong Hu AU - David Boon Kiang Lim AU - Percis Teena Christopher Subhodayam AU - Kui Yao PY - 2025 JO - Advanced Materials DO - 10.1002/adma.202519418 UR - https://doi.org/10.1002/adma.202519418 ER -
APA
Li, H., Acharya, S., Han, J. K., Zhang, M. S., Lee, P. S., Hu, J., Lim, D. B. K., Subhodayam, P. T. C., & Yao, K. (2025). High Photostrictive Strain Rate in Ferroelectric AlScN Thin Films. Advanced Materials. https://doi.org/10.1002/adma.202519418
Source records
- crossref · retrieved 2026-11-10T20:16:29.848Z