Metal-Ligand Coordination Enables Molecular Resist-Based Direct Write Lithography of Metal Halides.

Sarkar P, Ghorai G, Mondal H, Malvi S, Thakur R, Karmakar S, Ali AVM, Sathe VG, Sagade AA, Rao DSS, Prasad SK, Matte HSSR, Polavarapu L, Velpula PK, Rao KDM.

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DOI: 10.1002/adma.74077
Published: 2026-07-22
Container: Adv Mater
Publisher: Not recorded
Open access: no

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Cite this work

BibTeX

@article{allodium:10.1002/adma.74077,
  title = {Metal-Ligand Coordination Enables Molecular Resist-Based Direct Write Lithography of Metal Halides.},
  author = {Sarkar P and  Ghorai G and  Mondal H and  Malvi S and  Thakur R and  Karmakar S and  Ali AVM and  Sathe VG and  Sagade AA and  Rao DSS and  Prasad SK and  Matte HSSR and  Polavarapu L and  Velpula PK and  Rao KDM.},
  year = {2026},
  journal = {Adv Mater},
  doi = {10.1002/adma.74077},
  url = {https://doi.org/10.1002/adma.74077}
}

RIS

TY  - JOUR
TI  - Metal-Ligand Coordination Enables Molecular Resist-Based Direct Write Lithography of Metal Halides.
AU  - Sarkar P
AU  -  Ghorai G
AU  -  Mondal H
AU  -  Malvi S
AU  -  Thakur R
AU  -  Karmakar S
AU  -  Ali AVM
AU  -  Sathe VG
AU  -  Sagade AA
AU  -  Rao DSS
AU  -  Prasad SK
AU  -  Matte HSSR
AU  -  Polavarapu L
AU  -  Velpula PK
AU  -  Rao KDM.
PY  - 2026
JO  - Adv Mater
DO  - 10.1002/adma.74077
UR  - https://doi.org/10.1002/adma.74077
ER  -

APA

P, S., G, G., H, M., S, M., R, T., S, K., AVM, A., VG, S., AA, S., DSS, R., SK, P., HSSR, M., L, P., PK, V., & KDM., R. (2026). Metal-Ligand Coordination Enables Molecular Resist-Based Direct Write Lithography of Metal Halides.. Adv Mater. https://doi.org/10.1002/adma.74077

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europe-pmc · retrieved 2026-09-25T17:12:10.742Z