Barrier-Assisted Plasma Doping for Spatially Selective Resistance Engineering in MoS(2) Transistors.
- DOI
- 10.1002/adma.74389
- Published
- 2026 Aug 1
- Container
- Advanced materials (Deerfield Beach, Fla.)
- Publisher
- Not recorded
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1002/adma.74389,
title = {Barrier-Assisted Plasma Doping for Spatially Selective Resistance Engineering in MoS(2) Transistors.},
author = {Lee I and Park J and Yoo S and Yu S and Kang M and Park S and Lee MK and Lim H and Kim D and Roh K and Kim S and Kim K and Ahn W and Kang K and Kim YH and Choi SY},
year = {2026},
journal = {Advanced materials (Deerfield Beach, Fla.)},
doi = {10.1002/adma.74389},
url = {https://doi.org/10.1002/adma.74389}
}RIS
TY - JOUR TI - Barrier-Assisted Plasma Doping for Spatially Selective Resistance Engineering in MoS(2) Transistors. AU - Lee I AU - Park J AU - Yoo S AU - Yu S AU - Kang M AU - Park S AU - Lee MK AU - Lim H AU - Kim D AU - Roh K AU - Kim S AU - Kim K AU - Ahn W AU - Kang K AU - Kim YH AU - Choi SY PY - 2026 JO - Advanced materials (Deerfield Beach, Fla.) DO - 10.1002/adma.74389 UR - https://doi.org/10.1002/adma.74389 ER -
APA
I, L., J, P., S, Y., S, Y., M, K., S, P., MK, L., H, L., D, K., K, R., S, K., K, K., W, A., K, K., YH, K., & SY, C. (2026). Barrier-Assisted Plasma Doping for Spatially Selective Resistance Engineering in MoS(2) Transistors.. Advanced materials (Deerfield Beach, Fla.). https://doi.org/10.1002/adma.74389
Source records
- pubmed · retrieved 2026-09-25T00:27:28.745Z