Orthogonal Passivation of Polar Facets for Efficient InSb Quantum Dot SWIR Photodetectors

Sile Hu, Yangning Zhang, Filip Dinic, Lizhou Fan, Benjamin Rehl, Oleksandr Voznyy, Sjoerd Hoogland, Edward H. Sargent

Open source

DOI
10.1002/adma.75563
Published
2026-11-03
Container
Advanced Materials
Publisher
Wiley
Open access
unknown

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BibTeX

@article{allodium:10.1002/adma.75563,
  title = {Orthogonal Passivation of Polar Facets for Efficient InSb Quantum Dot SWIR Photodetectors},
  author = {Sile Hu and Yangning Zhang and Filip Dinic and Lizhou Fan and Benjamin Rehl and Oleksandr Voznyy and Sjoerd Hoogland and Edward H. Sargent},
  year = {2026},
  journal = {Advanced Materials},
  doi = {10.1002/adma.75563},
  url = {https://doi.org/10.1002/adma.75563}
}

RIS

TY  - JOUR
TI  - Orthogonal Passivation of Polar Facets for Efficient InSb Quantum Dot SWIR Photodetectors
AU  - Sile Hu
AU  - Yangning Zhang
AU  - Filip Dinic
AU  - Lizhou Fan
AU  - Benjamin Rehl
AU  - Oleksandr Voznyy
AU  - Sjoerd Hoogland
AU  - Edward H. Sargent
PY  - 2026
JO  - Advanced Materials
DO  - 10.1002/adma.75563
UR  - https://doi.org/10.1002/adma.75563
ER  - 

APA

Hu, S., Zhang, Y., Dinic, F., Fan, L., Rehl, B., Voznyy, O., Hoogland, S., & Sargent, E. H. (2026). Orthogonal Passivation of Polar Facets for Efficient InSb Quantum Dot SWIR Photodetectors. Advanced Materials. https://doi.org/10.1002/adma.75563

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