Triple‐State Invisible Photonic Crystal Pattern Encrypted in Hollow‐Silica/Polyurethane Film for Anticounterfeiting Applications

Xin Zhang, Qianqian Fu, Jianping Ge

Open source

DOI
10.1002/adpr.202000208
Published
2021-03-08
Container
Advanced Photonics Research
Publisher
Wiley
Open access
unknown

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BibTeX

@article{allodium:10.1002/adpr.202000208,
  title = {Triple‐State Invisible Photonic Crystal Pattern Encrypted in Hollow‐Silica/Polyurethane Film for Anticounterfeiting Applications},
  author = {Xin Zhang and Qianqian Fu and Jianping Ge},
  year = {2021},
  journal = {Advanced Photonics Research},
  doi = {10.1002/adpr.202000208},
  url = {https://doi.org/10.1002/adpr.202000208}
}

RIS

TY  - JOUR
TI  - Triple‐State Invisible Photonic Crystal Pattern Encrypted in Hollow‐Silica/Polyurethane Film for Anticounterfeiting Applications
AU  - Xin Zhang
AU  - Qianqian Fu
AU  - Jianping Ge
PY  - 2021
JO  - Advanced Photonics Research
DO  - 10.1002/adpr.202000208
UR  - https://doi.org/10.1002/adpr.202000208
ER  - 

APA

Zhang, X., Fu, Q., & Ge, J. (2021). Triple‐State Invisible Photonic Crystal Pattern Encrypted in Hollow‐Silica/Polyurethane Film for Anticounterfeiting Applications. Advanced Photonics Research. https://doi.org/10.1002/adpr.202000208

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