Small and Simple Molecular Structure Based Thermally Stable Ruthenium Precursor in Advancing Ruthenium ALD Process for Scaled Interconnect Metallization.
- DOI
- 10.1002/advs.202519209
- Published
- 2026 Feb
- Container
- Advanced science (Weinheim, Baden-Wurttemberg, Germany)
- Publisher
- Not recorded
- Open access
- yes
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Cite this work
BibTeX
@article{allodium:10.1002/advs.202519209,
title = {Small and Simple Molecular Structure Based Thermally Stable Ruthenium Precursor in Advancing Ruthenium ALD Process for Scaled Interconnect Metallization.},
author = {Nakatsubo H and Mohapatra D and Lee ES and Kim J and Cho I and Iseki M and Shigetomi T and Harada R and Na SW and Cheon T and Shong B and Kim SH},
year = {2026},
journal = {Advanced science (Weinheim, Baden-Wurttemberg, Germany)},
doi = {10.1002/advs.202519209},
url = {https://doi.org/10.1002/advs.202519209}
}RIS
TY - JOUR TI - Small and Simple Molecular Structure Based Thermally Stable Ruthenium Precursor in Advancing Ruthenium ALD Process for Scaled Interconnect Metallization. AU - Nakatsubo H AU - Mohapatra D AU - Lee ES AU - Kim J AU - Cho I AU - Iseki M AU - Shigetomi T AU - Harada R AU - Na SW AU - Cheon T AU - Shong B AU - Kim SH PY - 2026 JO - Advanced science (Weinheim, Baden-Wurttemberg, Germany) DO - 10.1002/advs.202519209 UR - https://doi.org/10.1002/advs.202519209 ER -
APA
H, N., D, M., ES, L., J, K., I, C., M, I., T, S., R, H., SW, N., T, C., B, S., & SH, K. (2026). Small and Simple Molecular Structure Based Thermally Stable Ruthenium Precursor in Advancing Ruthenium ALD Process for Scaled Interconnect Metallization.. Advanced science (Weinheim, Baden-Wurttemberg, Germany). https://doi.org/10.1002/advs.202519209
Source records
- pubmed · retrieved 2026-09-25T13:02:09.983Z