Threshold‐Voltage Modulation and N <sub>2</sub> O Plasma Passivation for Enhanced Retention and Memory Window in Capacitorless 2T0C DRAM Oxide Thin‐Film Transistors
- DOI
- 10.1002/advs.202523540
- Published
- 2026-03-03
- Container
- Advanced Science
- Publisher
- Wiley
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1002/advs.202523540,
title = {Threshold‐Voltage Modulation and N
<sub>2</sub>
O Plasma Passivation for Enhanced Retention and Memory Window in Capacitorless 2T0C DRAM Oxide Thin‐Film Transistors},
author = {Chahwan Yang and Mirinae Lee and Junghoon Han and Sooji Nam},
year = {2026},
journal = {Advanced Science},
doi = {10.1002/advs.202523540},
url = {https://doi.org/10.1002/advs.202523540}
}RIS
TY - JOUR
TI - Threshold‐Voltage Modulation and N
<sub>2</sub>
O Plasma Passivation for Enhanced Retention and Memory Window in Capacitorless 2T0C DRAM Oxide Thin‐Film Transistors
AU - Chahwan Yang
AU - Mirinae Lee
AU - Junghoon Han
AU - Sooji Nam
PY - 2026
JO - Advanced Science
DO - 10.1002/advs.202523540
UR - https://doi.org/10.1002/advs.202523540
ER - APA
Yang, C., Lee, M., Han, J., & Nam, S. (2026). Threshold‐Voltage Modulation and N <sub>2</sub> O Plasma Passivation for Enhanced Retention and Memory Window in Capacitorless 2T0C DRAM Oxide Thin‐Film Transistors. Advanced Science. https://doi.org/10.1002/advs.202523540
Source records
- crossref · retrieved 2026-09-25T17:45:17.595Z