Deposition Rate-Controlled Functional Evolution of p-Type Selenium-Alloyed Tellurium-Tellurium Oxide Films for Thin-Film Transistors.
- DOI
- 10.1002/advs.77618
- Published
- 2026 Sep 8
- Container
- Advanced science (Weinheim, Baden-Wurttemberg, Germany)
- Publisher
- Not recorded
- Open access
- yes
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Cite this work
BibTeX
@article{allodium:10.1002/advs.77618,
title = {Deposition Rate-Controlled Functional Evolution of p-Type Selenium-Alloyed Tellurium-Tellurium Oxide Films for Thin-Film Transistors.},
author = {Kang S and Seo JM and Choi H and Song Y and Yoon TW and Han TW and Shin H and Lee J and Kang B},
year = {2026},
journal = {Advanced science (Weinheim, Baden-Wurttemberg, Germany)},
doi = {10.1002/advs.77618},
url = {https://doi.org/10.1002/advs.77618}
}RIS
TY - JOUR TI - Deposition Rate-Controlled Functional Evolution of p-Type Selenium-Alloyed Tellurium-Tellurium Oxide Films for Thin-Film Transistors. AU - Kang S AU - Seo JM AU - Choi H AU - Song Y AU - Yoon TW AU - Han TW AU - Shin H AU - Lee J AU - Kang B PY - 2026 JO - Advanced science (Weinheim, Baden-Wurttemberg, Germany) DO - 10.1002/advs.77618 UR - https://doi.org/10.1002/advs.77618 ER -
APA
S, K., JM, S., H, C., Y, S., TW, Y., TW, H., H, S., J, L., & B, K. (2026). Deposition Rate-Controlled Functional Evolution of p-Type Selenium-Alloyed Tellurium-Tellurium Oxide Films for Thin-Film Transistors.. Advanced science (Weinheim, Baden-Wurttemberg, Germany). https://doi.org/10.1002/advs.77618
Source records
- pubmed · retrieved 2026-09-25T12:50:25.038Z