Pyrolyzed Photoresist as a Continuous-Tone Mask for Grayscale Lithography.

Creason TD, Gee GC, Piontkowski ZT, Ton-That T, Reyna R, Arata ER, Risley M, Boissiere JD, Kaehr B, Burckel DB

DOI: 10.1002/advs.78394
Published: 2026 Oct 18
Container: Advanced science (Weinheim, Baden-Wurttemberg, Germany)
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1002/advs.78394,
  title = {Pyrolyzed Photoresist as a Continuous-Tone Mask for Grayscale Lithography.},
  author = {Creason TD and Gee GC and Piontkowski ZT and Ton-That T and Reyna R and Arata ER and Risley M and Boissiere JD and Kaehr B and Burckel DB},
  year = {2026},
  journal = {Advanced science (Weinheim, Baden-Wurttemberg, Germany)},
  doi = {10.1002/advs.78394},
  url = {https://doi.org/10.1002/advs.78394}
}

RIS

TY  - JOUR
TI  - Pyrolyzed Photoresist as a Continuous-Tone Mask for Grayscale Lithography.
AU  - Creason TD
AU  - Gee GC
AU  - Piontkowski ZT
AU  - Ton-That T
AU  - Reyna R
AU  - Arata ER
AU  - Risley M
AU  - Boissiere JD
AU  - Kaehr B
AU  - Burckel DB
PY  - 2026
JO  - Advanced science (Weinheim, Baden-Wurttemberg, Germany)
DO  - 10.1002/advs.78394
UR  - https://doi.org/10.1002/advs.78394
ER  -

APA

TD, C., GC, G., ZT, P., T, T., R, R., ER, A., M, R., JD, B., B, K., & DB, B. (2026). Pyrolyzed Photoresist as a Continuous-Tone Mask for Grayscale Lithography.. Advanced science (Weinheim, Baden-Wurttemberg, Germany). https://doi.org/10.1002/advs.78394

Source records

pubmed · retrieved 2026-11-10T05:52:59.572Z
europe-pmc · retrieved 2026-11-10T05:52:59.584Z