Tri‐Layer Heterostructure Channel of a‐IGZO/a‐ITZO/a‐IGZO Toward Enhancement of Transport and Reliability in Amorphous Oxide Semiconductor Thin Film Transistors
- DOI
- 10.1002/aelm.202400266
- Published
- 02
- Container
- Advanced Electronic Materials
- Publisher
- Not recorded
- Open access
- yes
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Cite this work
BibTeX
@article{allodium:10.1002/aelm.202400266,
title = {Tri‐Layer Heterostructure Channel of a‐IGZO/a‐ITZO/a‐IGZO Toward Enhancement of Transport and Reliability in Amorphous Oxide Semiconductor Thin Film Transistors},
author = {Ke Hu and Zean Guo and Jiawei Wang and Congyan Lu and Mingliang Wang and Tianyuan Wang and Fuxi Liao and Guanhua Yang and Nianduan Lu and Ling Li},
year = {2025},
journal = {Advanced Electronic Materials},
doi = {10.1002/aelm.202400266},
url = {https://doi.org/10.1002/aelm.202400266}
}RIS
TY - JOUR TI - Tri‐Layer Heterostructure Channel of a‐IGZO/a‐ITZO/a‐IGZO Toward Enhancement of Transport and Reliability in Amorphous Oxide Semiconductor Thin Film Transistors AU - Ke Hu AU - Zean Guo AU - Jiawei Wang AU - Congyan Lu AU - Mingliang Wang AU - Tianyuan Wang AU - Fuxi Liao AU - Guanhua Yang AU - Nianduan Lu AU - Ling Li PY - 2025 JO - Advanced Electronic Materials DO - 10.1002/aelm.202400266 UR - https://doi.org/10.1002/aelm.202400266 ER -
APA
Hu, K., Guo, Z., Wang, J., Lu, C., Wang, M., Wang, T., Liao, F., Yang, G., Lu, N., & Li, L. (2025). Tri‐Layer Heterostructure Channel of a‐IGZO/a‐ITZO/a‐IGZO Toward Enhancement of Transport and Reliability in Amorphous Oxide Semiconductor Thin Film Transistors. Advanced Electronic Materials. https://doi.org/10.1002/aelm.202400266
Source records
- doaj · retrieved 2026-11-10T14:31:23.917Z