Tri‐Layer Heterostructure Channel of a‐IGZO/a‐ITZO/a‐IGZO Toward Enhancement of Transport and Reliability in Amorphous Oxide Semiconductor Thin Film Transistors

Ke Hu, Zean Guo, Jiawei Wang, Congyan Lu, Mingliang Wang, Tianyuan Wang, Fuxi Liao, Guanhua Yang, Nianduan Lu, Ling Li

Open source

DOI
10.1002/aelm.202400266
Published
02
Container
Advanced Electronic Materials
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.1002/aelm.202400266,
  title = {Tri‐Layer Heterostructure Channel of a‐IGZO/a‐ITZO/a‐IGZO Toward Enhancement of Transport and Reliability in Amorphous Oxide Semiconductor Thin Film Transistors},
  author = {Ke Hu and Zean Guo and Jiawei Wang and Congyan Lu and Mingliang Wang and Tianyuan Wang and Fuxi Liao and Guanhua Yang and Nianduan Lu and Ling Li},
  year = {2025},
  journal = {Advanced Electronic Materials},
  doi = {10.1002/aelm.202400266},
  url = {https://doi.org/10.1002/aelm.202400266}
}

RIS

TY  - JOUR
TI  - Tri‐Layer Heterostructure Channel of a‐IGZO/a‐ITZO/a‐IGZO Toward Enhancement of Transport and Reliability in Amorphous Oxide Semiconductor Thin Film Transistors
AU  - Ke Hu
AU  - Zean Guo
AU  - Jiawei Wang
AU  - Congyan Lu
AU  - Mingliang Wang
AU  - Tianyuan Wang
AU  - Fuxi Liao
AU  - Guanhua Yang
AU  - Nianduan Lu
AU  - Ling Li
PY  - 2025
JO  - Advanced Electronic Materials
DO  - 10.1002/aelm.202400266
UR  - https://doi.org/10.1002/aelm.202400266
ER  - 

APA

Hu, K., Guo, Z., Wang, J., Lu, C., Wang, M., Wang, T., Liao, F., Yang, G., Lu, N., & Li, L. (2025). Tri‐Layer Heterostructure Channel of a‐IGZO/a‐ITZO/a‐IGZO Toward Enhancement of Transport and Reliability in Amorphous Oxide Semiconductor Thin Film Transistors. Advanced Electronic Materials. https://doi.org/10.1002/aelm.202400266

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