Band Alignment Engineering in 2D Ferroelectric Van der Waals Heterostructures for All‐In‐One Optoelectronic Architecture

Yanan Lu, Dabao Xie, Congmin Zhang, Dan Cao, Xiaoshuang Chen, Haibo Shu

Open source

DOI: 10.1002/aelm.202400269
Published: 02
Container: Advanced Electronic Materials
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1002/aelm.202400269,
  title = {Band Alignment Engineering in 2D Ferroelectric Van der Waals Heterostructures for All‐In‐One Optoelectronic Architecture},
  author = {Yanan Lu and Dabao Xie and Congmin Zhang and Dan Cao and Xiaoshuang Chen and Haibo Shu},
  year = {2025},
  journal = {Advanced Electronic Materials},
  doi = {10.1002/aelm.202400269},
  url = {https://doi.org/10.1002/aelm.202400269}
}

RIS

TY  - JOUR
TI  - Band Alignment Engineering in 2D Ferroelectric Van der Waals Heterostructures for All‐In‐One Optoelectronic Architecture
AU  - Yanan Lu
AU  - Dabao Xie
AU  - Congmin Zhang
AU  - Dan Cao
AU  - Xiaoshuang Chen
AU  - Haibo Shu
PY  - 2025
JO  - Advanced Electronic Materials
DO  - 10.1002/aelm.202400269
UR  - https://doi.org/10.1002/aelm.202400269
ER  -

APA

Lu, Y., Xie, D., Zhang, C., Cao, D., Chen, X., & Shu, H. (2025). Band Alignment Engineering in 2D Ferroelectric Van der Waals Heterostructures for All‐In‐One Optoelectronic Architecture. Advanced Electronic Materials. https://doi.org/10.1002/aelm.202400269

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doaj · retrieved 2026-09-25T08:50:54.764Z