Water-Processable PVA-SbQ as an Eco-Friendly Photoreversible Dual-Tone Photoresist for Advanced Lithography.

Kim HJ, Eom JH, Park MJ, Cho SY, Yun JM, Kim G, Lee JK, Choi JH, Ganesan R

DOI: 10.1002/asia.70549
Published: 2026 Jan
Container: Chemistry, an Asian journal
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1002/asia.70549,
  title = {Water-Processable PVA-SbQ as an Eco-Friendly Photoreversible Dual-Tone Photoresist for Advanced Lithography.},
  author = {Kim HJ and Eom JH and Park MJ and Cho SY and Yun JM and Kim G and Lee JK and Choi JH and Ganesan R},
  year = {2026},
  journal = {Chemistry, an Asian journal},
  doi = {10.1002/asia.70549},
  url = {https://doi.org/10.1002/asia.70549}
}

RIS

TY  - JOUR
TI  - Water-Processable PVA-SbQ as an Eco-Friendly Photoreversible Dual-Tone Photoresist for Advanced Lithography.
AU  - Kim HJ
AU  - Eom JH
AU  - Park MJ
AU  - Cho SY
AU  - Yun JM
AU  - Kim G
AU  - Lee JK
AU  - Choi JH
AU  - Ganesan R
PY  - 2026
JO  - Chemistry, an Asian journal
DO  - 10.1002/asia.70549
UR  - https://doi.org/10.1002/asia.70549
ER  -

APA

HJ, K., JH, E., MJ, P., SY, C., JM, Y., G, K., JK, L., JH, C., & R, G. (2026). Water-Processable PVA-SbQ as an Eco-Friendly Photoreversible Dual-Tone Photoresist for Advanced Lithography.. Chemistry, an Asian journal. https://doi.org/10.1002/asia.70549

Source records

pubmed · retrieved 2026-09-26T12:21:43.208Z