A Multi‐Resistance Coupled Electromechanical Model for Enhanced Droplet Transport Dynamics Precision in Optoelectrowetting Chip

Tianyi Wang, Xuekai Liu, Jianghao Zeng, Hong Yan, Yongbo Deng, Teng Zhou, Liuyong Shi

Open source

DOI
10.1002/elps.70092
Published
2026-04-05
Container
ELECTROPHORESIS
Publisher
Wiley
Open access
unknown

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BibTeX

@article{allodium:10.1002/elps.70092,
  title = {A Multi‐Resistance Coupled Electromechanical Model for Enhanced Droplet Transport Dynamics Precision in Optoelectrowetting Chip},
  author = {Tianyi Wang and Xuekai Liu and Jianghao Zeng and Hong Yan and Yongbo Deng and Teng Zhou and Liuyong Shi},
  year = {2026},
  journal = {ELECTROPHORESIS},
  doi = {10.1002/elps.70092},
  url = {https://doi.org/10.1002/elps.70092}
}

RIS

TY  - JOUR
TI  - A Multi‐Resistance Coupled Electromechanical Model for Enhanced Droplet Transport Dynamics Precision in Optoelectrowetting Chip
AU  - Tianyi Wang
AU  - Xuekai Liu
AU  - Jianghao Zeng
AU  - Hong Yan
AU  - Yongbo Deng
AU  - Teng Zhou
AU  - Liuyong Shi
PY  - 2026
JO  - ELECTROPHORESIS
DO  - 10.1002/elps.70092
UR  - https://doi.org/10.1002/elps.70092
ER  - 

APA

Wang, T., Liu, X., Zeng, J., Yan, H., Deng, Y., Zhou, T., & Shi, L. (2026). A Multi‐Resistance Coupled Electromechanical Model for Enhanced Droplet Transport Dynamics Precision in Optoelectrowetting Chip. ELECTROPHORESIS. https://doi.org/10.1002/elps.70092

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