A Multi‐Resistance Coupled Electromechanical Model for Enhanced Droplet Transport Dynamics Precision in Optoelectrowetting Chip
- DOI
- 10.1002/elps.70092
- Published
- 2026-04-05
- Container
- ELECTROPHORESIS
- Publisher
- Wiley
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1002/elps.70092,
title = {A Multi‐Resistance Coupled Electromechanical Model for Enhanced Droplet Transport Dynamics Precision in Optoelectrowetting Chip},
author = {Tianyi Wang and Xuekai Liu and Jianghao Zeng and Hong Yan and Yongbo Deng and Teng Zhou and Liuyong Shi},
year = {2026},
journal = {ELECTROPHORESIS},
doi = {10.1002/elps.70092},
url = {https://doi.org/10.1002/elps.70092}
}RIS
TY - JOUR TI - A Multi‐Resistance Coupled Electromechanical Model for Enhanced Droplet Transport Dynamics Precision in Optoelectrowetting Chip AU - Tianyi Wang AU - Xuekai Liu AU - Jianghao Zeng AU - Hong Yan AU - Yongbo Deng AU - Teng Zhou AU - Liuyong Shi PY - 2026 JO - ELECTROPHORESIS DO - 10.1002/elps.70092 UR - https://doi.org/10.1002/elps.70092 ER -
APA
Wang, T., Liu, X., Zeng, J., Yan, H., Deng, Y., Zhou, T., & Shi, L. (2026). A Multi‐Resistance Coupled Electromechanical Model for Enhanced Droplet Transport Dynamics Precision in Optoelectrowetting Chip. ELECTROPHORESIS. https://doi.org/10.1002/elps.70092
Source records
- crossref · retrieved 2026-09-27T04:23:46.065Z