Precursor Design Principles for Area‐Selective Atomic Layer Deposition of Alumina: Quantifying the Role of Lewis Acidity, Steric Repulsion, and Dimerization in Surface Adsorption
- DOI
- 10.1002/jcc.70493
- Published
- 2026-09-03
- Container
- Journal of Computational Chemistry
- Publisher
- Wiley
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1002/jcc.70493,
title = {Precursor Design Principles for Area‐Selective Atomic Layer Deposition of Alumina: Quantifying the Role of Lewis Acidity, Steric Repulsion, and Dimerization in Surface Adsorption},
author = {Patrick Maue and Douglas L. Miller and Fabian Pieck and Ralf Tonner‐Zech},
year = {2026},
journal = {Journal of Computational Chemistry},
doi = {10.1002/jcc.70493},
url = {https://doi.org/10.1002/jcc.70493}
}RIS
TY - JOUR TI - Precursor Design Principles for Area‐Selective Atomic Layer Deposition of Alumina: Quantifying the Role of Lewis Acidity, Steric Repulsion, and Dimerization in Surface Adsorption AU - Patrick Maue AU - Douglas L. Miller AU - Fabian Pieck AU - Ralf Tonner‐Zech PY - 2026 JO - Journal of Computational Chemistry DO - 10.1002/jcc.70493 UR - https://doi.org/10.1002/jcc.70493 ER -
APA
Maue, P., Miller, D. L., Pieck, F., & Tonner‐Zech, R. (2026). Precursor Design Principles for Area‐Selective Atomic Layer Deposition of Alumina: Quantifying the Role of Lewis Acidity, Steric Repulsion, and Dimerization in Surface Adsorption. Journal of Computational Chemistry. https://doi.org/10.1002/jcc.70493
Source records
- crossref · retrieved 2026-09-27T04:28:23.520Z