Magnetic properties and I‐V characteristics of DC magnetron sputtered [Co (0.2 nm)/Ni (0.4 nm)]<sub>10</sub> thin films

Subrata Sarkar, Rafikul Hussain, Dhananjoy Rajbanshi, Sandeep Kumar Srivastava

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DOI: 10.1002/metm.29
Published: 2024-11-19
Container: MetalMat
Publisher: Wiley
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1002/metm.29,
  title = {Magnetic properties and I‐V characteristics of DC magnetron sputtered [Co (0.2 nm)/Ni (0.4 nm)]<sub>10</sub> thin films},
  author = {Subrata Sarkar and Rafikul Hussain and Dhananjoy Rajbanshi and Sandeep Kumar Srivastava},
  year = {2024},
  journal = {MetalMat},
  doi = {10.1002/metm.29},
  url = {https://doi.org/10.1002/metm.29}
}

RIS

TY  - JOUR
TI  - Magnetic properties and I‐V characteristics of DC magnetron sputtered [Co (0.2 nm)/Ni (0.4 nm)]<sub>10</sub> thin films
AU  - Subrata Sarkar
AU  - Rafikul Hussain
AU  - Dhananjoy Rajbanshi
AU  - Sandeep Kumar Srivastava
PY  - 2024
JO  - MetalMat
DO  - 10.1002/metm.29
UR  - https://doi.org/10.1002/metm.29
ER  -

APA

Sarkar, S., Hussain, R., Rajbanshi, D., & Srivastava, S. K. (2024). Magnetic properties and I‐V characteristics of DC magnetron sputtered [Co (0.2 nm)/Ni (0.4 nm)]<sub>10</sub> thin films. MetalMat. https://doi.org/10.1002/metm.29

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crossref · retrieved 2026-09-24T22:36:12.950Z