Small Al cluster ion implantation into Si and 4H‐SiC

Xiaomei Zeng, Vasiliy Pelenovich, Alexei Ieshkin, Andrey Danilov, Alexander Tolstogouzov, Wenbin Zuo, Jha Ranjana, Donghong Hu, Neena Devi, Dejun Fu, Xiangheng Xiao

Open source

DOI: 10.1002/rcm.8489
Published: 2019-08-06
Container: Rapid Communications in Mass Spectrometry
Publisher: Wiley
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1002/rcm.8489,
  title = {Small Al cluster ion implantation into Si and 4H‐SiC},
  author = {Xiaomei Zeng and Vasiliy Pelenovich and Alexei Ieshkin and Andrey Danilov and Alexander Tolstogouzov and Wenbin Zuo and Jha Ranjana and Donghong Hu and Neena Devi and Dejun Fu and Xiangheng Xiao},
  year = {2019},
  journal = {Rapid Communications in Mass Spectrometry},
  doi = {10.1002/rcm.8489},
  url = {https://doi.org/10.1002/rcm.8489}
}

RIS

TY  - JOUR
TI  - Small Al cluster ion implantation into Si and 4H‐SiC
AU  - Xiaomei Zeng
AU  - Vasiliy Pelenovich
AU  - Alexei Ieshkin
AU  - Andrey Danilov
AU  - Alexander Tolstogouzov
AU  - Wenbin Zuo
AU  - Jha Ranjana
AU  - Donghong Hu
AU  - Neena Devi
AU  - Dejun Fu
AU  - Xiangheng Xiao
PY  - 2019
JO  - Rapid Communications in Mass Spectrometry
DO  - 10.1002/rcm.8489
UR  - https://doi.org/10.1002/rcm.8489
ER  -

APA

Zeng, X., Pelenovich, V., Ieshkin, A., Danilov, A., Tolstogouzov, A., Zuo, W., Ranjana, J., Hu, D., Devi, N., Fu, D., & Xiao, X. (2019). Small Al cluster ion implantation into Si and 4H‐SiC. Rapid Communications in Mass Spectrometry. https://doi.org/10.1002/rcm.8489

Source records

crossref · retrieved 2026-09-25T17:10:07.224Z