Preventing Plasma‐Induced Resist Hardening in Molybdenum Disulfide Transistors via Sacrificial Metal Mask Lithography
- DOI
- 10.1002/smll.75023
- Published
- 2026-08-11
- Container
- Small
- Publisher
- Wiley
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1002/smll.75023,
title = {Preventing Plasma‐Induced Resist Hardening in Molybdenum Disulfide Transistors via Sacrificial Metal Mask Lithography},
author = {Dahyeon Kim and Yanfeng Zhao and Sungyeon Kim and Seungchan Lee and Sangmin Eom and Tae Yeon Kim and Hyun Seok Lee and Joonki Suh and Byungjo Kim and Myungsoo Kim},
year = {2026},
journal = {Small},
doi = {10.1002/smll.75023},
url = {https://doi.org/10.1002/smll.75023}
}RIS
TY - JOUR TI - Preventing Plasma‐Induced Resist Hardening in Molybdenum Disulfide Transistors via Sacrificial Metal Mask Lithography AU - Dahyeon Kim AU - Yanfeng Zhao AU - Sungyeon Kim AU - Seungchan Lee AU - Sangmin Eom AU - Tae Yeon Kim AU - Hyun Seok Lee AU - Joonki Suh AU - Byungjo Kim AU - Myungsoo Kim PY - 2026 JO - Small DO - 10.1002/smll.75023 UR - https://doi.org/10.1002/smll.75023 ER -
APA
Kim, D., Zhao, Y., Kim, S., Lee, S., Eom, S., Kim, T. Y., Lee, H. S., Suh, J., Kim, B., & Kim, M. (2026). Preventing Plasma‐Induced Resist Hardening in Molybdenum Disulfide Transistors via Sacrificial Metal Mask Lithography. Small. https://doi.org/10.1002/smll.75023
Source records
- crossref · retrieved 2026-09-25T10:14:04.359Z