Ligand-Mediated Nuclearity Tuning of Tin Oxo Clusters for Advanced Lithography.

Ha SJ, Lee JY, Kwon BK, Gyeong SG, Jeon D, Jang JH

DOI: 10.1002/smll.75331
Published: 2026 Aug 25
Container: Small (Weinheim an der Bergstrasse, Germany)
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1002/smll.75331,
  title = {Ligand-Mediated Nuclearity Tuning of Tin Oxo Clusters for Advanced Lithography.},
  author = {Ha SJ and Lee JY and Kwon BK and Gyeong SG and Jeon D and Jang JH},
  year = {2026},
  journal = {Small (Weinheim an der Bergstrasse, Germany)},
  doi = {10.1002/smll.75331},
  url = {https://doi.org/10.1002/smll.75331}
}

RIS

TY  - JOUR
TI  - Ligand-Mediated Nuclearity Tuning of Tin Oxo Clusters for Advanced Lithography.
AU  - Ha SJ
AU  - Lee JY
AU  - Kwon BK
AU  - Gyeong SG
AU  - Jeon D
AU  - Jang JH
PY  - 2026
JO  - Small (Weinheim an der Bergstrasse, Germany)
DO  - 10.1002/smll.75331
UR  - https://doi.org/10.1002/smll.75331
ER  -

APA

SJ, H., JY, L., BK, K., SG, G., D, J., & JH, J. (2026). Ligand-Mediated Nuclearity Tuning of Tin Oxo Clusters for Advanced Lithography.. Small (Weinheim an der Bergstrasse, Germany). https://doi.org/10.1002/smll.75331

Source records

pubmed · retrieved 2026-09-25T10:09:58.634Z