A Temperature-Controlled Plasma Strategy Toward High-Purity Submicron Graphene.

Zeng X, He P, Wang LB, Shen J, Wu M, Ding G

DOI: 10.1002/smll.75957
Published: 2026 Sep 29
Container: Small (Weinheim an der Bergstrasse, Germany)
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1002/smll.75957,
  title = {A Temperature-Controlled Plasma Strategy Toward High-Purity Submicron Graphene.},
  author = {Zeng X and He P and Wang LB and Shen J and Wu M and Ding G},
  year = {2026},
  journal = {Small (Weinheim an der Bergstrasse, Germany)},
  doi = {10.1002/smll.75957},
  url = {https://doi.org/10.1002/smll.75957}
}

RIS

TY  - JOUR
TI  - A Temperature-Controlled Plasma Strategy Toward High-Purity Submicron Graphene.
AU  - Zeng X
AU  - He P
AU  - Wang LB
AU  - Shen J
AU  - Wu M
AU  - Ding G
PY  - 2026
JO  - Small (Weinheim an der Bergstrasse, Germany)
DO  - 10.1002/smll.75957
UR  - https://doi.org/10.1002/smll.75957
ER  -

APA

X, Z., P, H., LB, W., J, S., M, W., & G, D. (2026). A Temperature-Controlled Plasma Strategy Toward High-Purity Submicron Graphene.. Small (Weinheim an der Bergstrasse, Germany). https://doi.org/10.1002/smll.75957

Source records

pubmed · retrieved 2026-11-10T10:17:18.743Z