Controllable and Nanoscale Linear Etching of Atomic Layer Deposited Molybdenum Using Cyclic Stepwise CHF <sub>3</sub> /O <sub>2</sub> Plasma
- DOI
- 10.1002/smll.76133
- Published
- 2026-10-07
- Container
- Small
- Publisher
- Wiley
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1002/smll.76133,
title = {Controllable and Nanoscale Linear Etching of Atomic Layer Deposited Molybdenum Using Cyclic Stepwise CHF
<sub>3</sub>
/O
<sub>2</sub>
Plasma},
author = {Boao Ma and Haijun Cheng and Xinwei Wu and Qiancheng Sun and Jin Xu and Xin‐Ping Qu},
year = {2026},
journal = {Small},
doi = {10.1002/smll.76133},
url = {https://doi.org/10.1002/smll.76133}
}RIS
TY - JOUR
TI - Controllable and Nanoscale Linear Etching of Atomic Layer Deposited Molybdenum Using Cyclic Stepwise CHF
<sub>3</sub>
/O
<sub>2</sub>
Plasma
AU - Boao Ma
AU - Haijun Cheng
AU - Xinwei Wu
AU - Qiancheng Sun
AU - Jin Xu
AU - Xin‐Ping Qu
PY - 2026
JO - Small
DO - 10.1002/smll.76133
UR - https://doi.org/10.1002/smll.76133
ER - APA
Ma, B., Cheng, H., Wu, X., Sun, Q., Xu, J., & Qu, X. (2026). Controllable and Nanoscale Linear Etching of Atomic Layer Deposited Molybdenum Using Cyclic Stepwise CHF <sub>3</sub> /O <sub>2</sub> Plasma. Small. https://doi.org/10.1002/smll.76133
Source records
- crossref · retrieved 2026-11-09T06:36:39.636Z