High Polarization‐Sensitivity Cs <sub>2</sub> AgBiBr <sub>6</sub> Lead‐Free Perovskite Vertically‐Architected Field‐Effect Phototransistors Fabricated via Optimal Nanoimprint Lithography

Bo Sun, Zhenpeng Cheng, Tianle Wang, Kunyan Li, Haifei Lu, Xiaoyan Wen, Songhua Xie, Ming‐Yu Li, Cong Wang, Sisi Liu

Open source

DOI
10.1002/smll.76394
Published
2026-10-20
Container
Small
Publisher
Wiley
Open access
unknown

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BibTeX

@article{allodium:10.1002/smll.76394,
  title = {High Polarization‐Sensitivity Cs
                    <sub>2</sub>
                    AgBiBr
                    <sub>6</sub>
                    Lead‐Free Perovskite Vertically‐Architected Field‐Effect Phototransistors Fabricated via Optimal Nanoimprint Lithography},
  author = {Bo Sun and Zhenpeng Cheng and Tianle Wang and Kunyan Li and Haifei Lu and Xiaoyan Wen and Songhua Xie and Ming‐Yu Li and Cong Wang and Sisi Liu},
  year = {2026},
  journal = {Small},
  doi = {10.1002/smll.76394},
  url = {https://doi.org/10.1002/smll.76394}
}

RIS

TY  - JOUR
TI  - High Polarization‐Sensitivity Cs
                    <sub>2</sub>
                    AgBiBr
                    <sub>6</sub>
                    Lead‐Free Perovskite Vertically‐Architected Field‐Effect Phototransistors Fabricated via Optimal Nanoimprint Lithography
AU  - Bo Sun
AU  - Zhenpeng Cheng
AU  - Tianle Wang
AU  - Kunyan Li
AU  - Haifei Lu
AU  - Xiaoyan Wen
AU  - Songhua Xie
AU  - Ming‐Yu Li
AU  - Cong Wang
AU  - Sisi Liu
PY  - 2026
JO  - Small
DO  - 10.1002/smll.76394
UR  - https://doi.org/10.1002/smll.76394
ER  - 

APA

Sun, B., Cheng, Z., Wang, T., Li, K., Lu, H., Wen, X., Xie, S., Li, M., Wang, C., & Liu, S. (2026). High Polarization‐Sensitivity Cs <sub>2</sub> AgBiBr <sub>6</sub> Lead‐Free Perovskite Vertically‐Architected Field‐Effect Phototransistors Fabricated via Optimal Nanoimprint Lithography. Small. https://doi.org/10.1002/smll.76394

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