Designing Stable Photoresists Using Polymers With Photoinduced Reversible Solid-to-Liquid Transitions for Nanoimprint Lithography.

Liang S, Xu M, Yuan C, Nie C, Wang B, Cao J, Zhao T, Wu S

DOI: 10.1002/smll.76466
Published: 2026 Oct 27
Container: Small (Weinheim an der Bergstrasse, Germany)
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1002/smll.76466,
  title = {Designing Stable Photoresists Using Polymers With Photoinduced Reversible Solid-to-Liquid Transitions for Nanoimprint Lithography.},
  author = {Liang S and Xu M and Yuan C and Nie C and Wang B and Cao J and Zhao T and Wu S},
  year = {2026},
  journal = {Small (Weinheim an der Bergstrasse, Germany)},
  doi = {10.1002/smll.76466},
  url = {https://doi.org/10.1002/smll.76466}
}

RIS

TY  - JOUR
TI  - Designing Stable Photoresists Using Polymers With Photoinduced Reversible Solid-to-Liquid Transitions for Nanoimprint Lithography.
AU  - Liang S
AU  - Xu M
AU  - Yuan C
AU  - Nie C
AU  - Wang B
AU  - Cao J
AU  - Zhao T
AU  - Wu S
PY  - 2026
JO  - Small (Weinheim an der Bergstrasse, Germany)
DO  - 10.1002/smll.76466
UR  - https://doi.org/10.1002/smll.76466
ER  -

APA

S, L., M, X., C, Y., C, N., B, W., J, C., T, Z., & S, W. (2026). Designing Stable Photoresists Using Polymers With Photoinduced Reversible Solid-to-Liquid Transitions for Nanoimprint Lithography.. Small (Weinheim an der Bergstrasse, Germany). https://doi.org/10.1002/smll.76466

Source records

pubmed · retrieved 2026-11-10T06:42:50.418Z