Polarity-engineered Sn-Ti cluster photoresists for sub-10-nm high-resolution lithography.

Wang D, Xu R, Zhang M, Gong X, Li W, Zhou D, Zhao J, Zhu H, Lu Z, Chen P, Peng X

DOI: 10.1002/smo2.70061
Published: 2026 May 18
Container: Smart molecules : open access
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1002/smo2.70061,
  title = {Polarity-engineered Sn-Ti cluster photoresists for sub-10-nm high-resolution lithography.},
  author = {Wang D and Xu R and Zhang M and Gong X and Li W and Zhou D and Zhao J and Zhu H and Lu Z and Chen P and Peng X},
  year = {2026},
  journal = {Smart molecules : open access},
  doi = {10.1002/smo2.70061},
  url = {https://doi.org/10.1002/smo2.70061}
}

RIS

TY  - JOUR
TI  - Polarity-engineered Sn-Ti cluster photoresists for sub-10-nm high-resolution lithography.
AU  - Wang D
AU  - Xu R
AU  - Zhang M
AU  - Gong X
AU  - Li W
AU  - Zhou D
AU  - Zhao J
AU  - Zhu H
AU  - Lu Z
AU  - Chen P
AU  - Peng X
PY  - 2026
JO  - Smart molecules : open access
DO  - 10.1002/smo2.70061
UR  - https://doi.org/10.1002/smo2.70061
ER  -

APA

D, W., R, X., M, Z., X, G., W, L., D, Z., J, Z., H, Z., Z, L., P, C., & X, P. (2026). Polarity-engineered Sn-Ti cluster photoresists for sub-10-nm high-resolution lithography.. Smart molecules : open access. https://doi.org/10.1002/smo2.70061

Source records

pubmed · retrieved 2026-09-25T09:21:38.106Z