Fluorinated copolymer resists for high‐resolution negative‐tone lithography: Preparation and patterning performance

Yuting Tang, Wenzheng Li, Xinyan Huang, Min Zhang, Han Han, Jialong Zhang, Qinyu Luo, Jiangli Fan, Pengzhong Chen, Xiaojun Peng

Open source

DOI: 10.1002/smo2.70062
Published: 2026-05-28
Container: Smart Molecules
Publisher: Wiley
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1002/smo2.70062,
  title = {Fluorinated copolymer resists for high‐resolution negative‐tone lithography: Preparation and patterning performance},
  author = {Yuting Tang and Wenzheng Li and Xinyan Huang and Min Zhang and Han Han and Jialong Zhang and Qinyu Luo and Jiangli Fan and Pengzhong Chen and Xiaojun Peng},
  year = {2026},
  journal = {Smart Molecules},
  doi = {10.1002/smo2.70062},
  url = {https://doi.org/10.1002/smo2.70062}
}

RIS

TY  - JOUR
TI  - Fluorinated copolymer resists for high‐resolution negative‐tone lithography: Preparation and patterning performance
AU  - Yuting Tang
AU  - Wenzheng Li
AU  - Xinyan Huang
AU  - Min Zhang
AU  - Han Han
AU  - Jialong Zhang
AU  - Qinyu Luo
AU  - Jiangli Fan
AU  - Pengzhong Chen
AU  - Xiaojun Peng
PY  - 2026
JO  - Smart Molecules
DO  - 10.1002/smo2.70062
UR  - https://doi.org/10.1002/smo2.70062
ER  -

APA

Tang, Y., Li, W., Huang, X., Zhang, M., Han, H., Zhang, J., Luo, Q., Fan, J., Chen, P., & Peng, X. (2026). Fluorinated copolymer resists for high‐resolution negative‐tone lithography: Preparation and patterning performance. Smart Molecules. https://doi.org/10.1002/smo2.70062

Source records

crossref · retrieved 2026-09-25T09:31:39.708Z