Growth of Highly‐Ordered‐Crystalline Indium‐Gallium‐Oxide Thin‐Film via Plasma‐Enhanced ALD for High Performance Top‐Gate Field‐Effect Transistors
- DOI
- 10.1002/smtd.202402070
- Published
- 2024-12-30
- Container
- Small Methods
- Publisher
- Wiley
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1002/smtd.202402070,
title = {Growth of Highly‐Ordered‐Crystalline Indium‐Gallium‐Oxide Thin‐Film via Plasma‐Enhanced ALD for High Performance Top‐Gate Field‐Effect Transistors},
author = {Min Jae Kim and Seon Woong Bang and Jae Seok Hur and Seong Hun Yoon and Cheol Hee Choi and Sang Won Chung and Jeong Eun Oh and Yena Kim and Bang Ju Park and Jeonga Lee and Hoichang Yang and Daewon Ha and Min Hee Cho and Jae Kyeong Jeong},
year = {2024},
journal = {Small Methods},
doi = {10.1002/smtd.202402070},
url = {https://doi.org/10.1002/smtd.202402070}
}RIS
TY - JOUR TI - Growth of Highly‐Ordered‐Crystalline Indium‐Gallium‐Oxide Thin‐Film via Plasma‐Enhanced ALD for High Performance Top‐Gate Field‐Effect Transistors AU - Min Jae Kim AU - Seon Woong Bang AU - Jae Seok Hur AU - Seong Hun Yoon AU - Cheol Hee Choi AU - Sang Won Chung AU - Jeong Eun Oh AU - Yena Kim AU - Bang Ju Park AU - Jeonga Lee AU - Hoichang Yang AU - Daewon Ha AU - Min Hee Cho AU - Jae Kyeong Jeong PY - 2024 JO - Small Methods DO - 10.1002/smtd.202402070 UR - https://doi.org/10.1002/smtd.202402070 ER -
APA
Kim, M. J., Bang, S. W., Hur, J. S., Yoon, S. H., Choi, C. H., Chung, S. W., Oh, J. E., Kim, Y., Park, B. J., Lee, J., Yang, H., Ha, D., Cho, M. H., & Jeong, J. K. (2024). Growth of Highly‐Ordered‐Crystalline Indium‐Gallium‐Oxide Thin‐Film via Plasma‐Enhanced ALD for High Performance Top‐Gate Field‐Effect Transistors. Small Methods. https://doi.org/10.1002/smtd.202402070
Source records
- crossref · retrieved 2026-09-27T13:09:09.529Z