Dry Development of Dry Coated Sn-Based Inorganic Resist for Defect-Suppressed and High-Resolution Patterning Process.

Kim HJ, Kim MC, Yeom GY

DOI: 10.1002/smtd.70794
Published: 2026 Jul
Container: Small methods
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1002/smtd.70794,
  title = {Dry Development of Dry Coated Sn-Based Inorganic Resist for Defect-Suppressed and High-Resolution Patterning Process.},
  author = {Kim HJ and Kim MC and Yeom GY},
  year = {2026},
  journal = {Small methods},
  doi = {10.1002/smtd.70794},
  url = {https://doi.org/10.1002/smtd.70794}
}

RIS

TY  - JOUR
TI  - Dry Development of Dry Coated Sn-Based Inorganic Resist for Defect-Suppressed and High-Resolution Patterning Process.
AU  - Kim HJ
AU  - Kim MC
AU  - Yeom GY
PY  - 2026
JO  - Small methods
DO  - 10.1002/smtd.70794
UR  - https://doi.org/10.1002/smtd.70794
ER  -

APA

HJ, K., MC, K., & GY, Y. (2026). Dry Development of Dry Coated Sn-Based Inorganic Resist for Defect-Suppressed and High-Resolution Patterning Process.. Small methods. https://doi.org/10.1002/smtd.70794

Source records

pubmed · retrieved 2026-09-25T00:33:24.353Z