Precise Sputter Control by Tailored Waveform Biasing for Selective Ablation in Future 2D Electronics Manufacturing

Anton Pletzer, Jonas Giesekus, Alexander Litke, Julian Schulze, Claudia Bock

Open source

DOI: 10.1002/smtd.71162
Published: 2026-10-29
Container: Small Methods
Publisher: Wiley
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1002/smtd.71162,
  title = {Precise Sputter Control by Tailored Waveform Biasing for Selective Ablation in Future 2D Electronics Manufacturing},
  author = {Anton Pletzer and Jonas Giesekus and Alexander Litke and Julian Schulze and Claudia Bock},
  year = {2026},
  journal = {Small Methods},
  doi = {10.1002/smtd.71162},
  url = {https://doi.org/10.1002/smtd.71162}
}

RIS

TY  - JOUR
TI  - Precise Sputter Control by Tailored Waveform Biasing for Selective Ablation in Future 2D Electronics Manufacturing
AU  - Anton Pletzer
AU  - Jonas Giesekus
AU  - Alexander Litke
AU  - Julian Schulze
AU  - Claudia Bock
PY  - 2026
JO  - Small Methods
DO  - 10.1002/smtd.71162
UR  - https://doi.org/10.1002/smtd.71162
ER  -

APA

Pletzer, A., Giesekus, J., Litke, A., Schulze, J., & Bock, C. (2026). Precise Sputter Control by Tailored Waveform Biasing for Selective Ablation in Future 2D Electronics Manufacturing. Small Methods. https://doi.org/10.1002/smtd.71162

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crossref · retrieved 2026-11-09T10:35:08.554Z