RETRACTED ARTICLE: Optimization of plasma etch rate of deposited thin films by adaptive neuro fuzzy inference system

Nikola Petrovic

DOI: 10.1007/s00170-022-10198-z
Published: 2022-09-24
Container: The International Journal of Advanced Manufacturing Technology
Publisher: Springer Science and Business Media LLC
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1007/s00170-022-10198-z,
  title = {RETRACTED ARTICLE: Optimization of plasma etch rate of deposited thin films by adaptive neuro fuzzy inference system},
  author = {Nikola Petrovic},
  year = {2022},
  journal = {The International Journal of Advanced Manufacturing Technology},
  doi = {10.1007/s00170-022-10198-z},
  url = {https://doi.org/10.1007/s00170-022-10198-z}
}

RIS

TY  - JOUR
TI  - RETRACTED ARTICLE: Optimization of plasma etch rate of deposited thin films by adaptive neuro fuzzy inference system
AU  - Nikola Petrovic
PY  - 2022
JO  - The International Journal of Advanced Manufacturing Technology
DO  - 10.1007/s00170-022-10198-z
UR  - https://doi.org/10.1007/s00170-022-10198-z
ER  -

APA

Petrovic, N. (2022). RETRACTED ARTICLE: Optimization of plasma etch rate of deposited thin films by adaptive neuro fuzzy inference system. The International Journal of Advanced Manufacturing Technology. https://doi.org/10.1007/s00170-022-10198-z

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crossref · retrieved 2026-09-25T08:52:21.998Z