Influence of metal assisted chemical etching time period on mesoporous structure in as-cut upgraded metallurgical grade silicon for solar cell application
- DOI
- 10.1007/s10854-019-01191-6
- Published
- 2019
- Container
- Journal of Materials Science: Materials in Electronics
- Publisher
- Not recorded
- Open access
- yes
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Cite this work
BibTeX
@article{allodium:10.1007/s10854-019-01191-6,
title = {Influence of metal assisted chemical etching time period on mesoporous structure in as-cut upgraded metallurgical grade silicon for solar cell application},
author = {Ragavendran Venkatesan and Jeyanthinath Mayandi and Joshua Pearce and Vishnukanthan Venkatachalapathy},
year = {2019},
journal = {Journal of Materials Science: Materials in Electronics},
doi = {10.1007/s10854-019-01191-6},
url = {https://doi.org/10.1007/s10854-019-01191-6}
}RIS
TY - JOUR TI - Influence of metal assisted chemical etching time period on mesoporous structure in as-cut upgraded metallurgical grade silicon for solar cell application AU - Ragavendran Venkatesan AU - Jeyanthinath Mayandi AU - Joshua Pearce AU - Vishnukanthan Venkatachalapathy PY - 2019 JO - Journal of Materials Science: Materials in Electronics DO - 10.1007/s10854-019-01191-6 UR - https://doi.org/10.1007/s10854-019-01191-6 ER -
APA
Venkatesan, R., Mayandi, J., Pearce, J., & Venkatachalapathy, V. (2019). Influence of metal assisted chemical etching time period on mesoporous structure in as-cut upgraded metallurgical grade silicon for solar cell application. Journal of Materials Science: Materials in Electronics. https://doi.org/10.1007/s10854-019-01191-6
Source records
- hal · retrieved 2026-09-26T16:48:50.248Z