High-quality polycrystalline vanadium dioxide thin films deposited via pulsed laser deposition with high uniformity and consistency

Zhixiang Huang, Kyle Laskowski, Sai Rahul Sitaram, Eric Herrmann, S M Jahadun Nobi, Ke Ma, Xi Wang

Open source

DOI: 10.1007/s10854-025-15921-6
Published: 2025-10
Container: Journal of Materials Science: Materials in Electronics
Publisher: Springer Science and Business Media LLC
Open access: unknown

Credibility signals

uncertain Score 64/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

supportingDOI registered: A matching record was returned by Crossref. Source: Crossref; license: CC0 metadata
supportingDOI resolves: A matching record was returned by Crossref. Source: Crossref; license: CC0 metadata
not scoredDirectory of Open Access Journals: No matching DOAJ record was present in this response. No allow-list match; this is not evidence of low credibility. Source: DOAJ; license: CC0
not scoredMEDLINE indexed: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredOpenAlex core source: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredKnown publisher allow-list: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredROR affiliation: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredRetraction Watch retraction: No retraction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch expression of concern: No expression of concern notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch correction: No correction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch reinstatement: No reinstatement notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredOpen access status: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication license: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication version: A publication version was supplied but is not scored. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer
supportingMetadata completeness: All 6 scored descriptive metadata groups are present. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer

Cite this work

BibTeX

@article{allodium:10.1007/s10854-025-15921-6,
  title = {High-quality polycrystalline vanadium dioxide thin films deposited via pulsed laser deposition with high uniformity and consistency},
  author = {Zhixiang Huang and Kyle Laskowski and Sai Rahul Sitaram and Eric Herrmann and S M Jahadun Nobi and Ke Ma and Xi Wang},
  year = {2025},
  journal = {Journal of Materials Science: Materials in Electronics},
  doi = {10.1007/s10854-025-15921-6},
  url = {https://doi.org/10.1007/s10854-025-15921-6}
}

RIS

TY  - JOUR
TI  - High-quality polycrystalline vanadium dioxide thin films deposited via pulsed laser deposition with high uniformity and consistency
AU  - Zhixiang Huang
AU  - Kyle Laskowski
AU  - Sai Rahul Sitaram
AU  - Eric Herrmann
AU  - S M Jahadun Nobi
AU  - Ke Ma
AU  - Xi Wang
PY  - 2025
JO  - Journal of Materials Science: Materials in Electronics
DO  - 10.1007/s10854-025-15921-6
UR  - https://doi.org/10.1007/s10854-025-15921-6
ER  -

APA

Huang, Z., Laskowski, K., Sitaram, S. R., Herrmann, E., Nobi, S. M. J., Ma, K., & Wang, X. (2025). High-quality polycrystalline vanadium dioxide thin films deposited via pulsed laser deposition with high uniformity and consistency. Journal of Materials Science: Materials in Electronics. https://doi.org/10.1007/s10854-025-15921-6

Source records

crossref · retrieved 2026-09-26T13:00:59.484Z