Oxide Semiconductor for Advanced Memory Architectures: Atomic Layer Deposition, Key Requirement and Challenges.

Lee CH, Ryu SH, Hwang T, Kim SH, Kim YS, Park JS

Open source

DOI
10.1007/s40820-025-02013-7
Published
2026 Jan 5
Container
Nano-micro letters
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.1007/s40820-025-02013-7,
  title = {Oxide Semiconductor for Advanced Memory Architectures: Atomic Layer Deposition, Key Requirement and Challenges.},
  author = {Lee CH and Ryu SH and Hwang T and Kim SH and Kim YS and Park JS},
  year = {2026},
  journal = {Nano-micro letters},
  doi = {10.1007/s40820-025-02013-7},
  url = {https://doi.org/10.1007/s40820-025-02013-7}
}

RIS

TY  - JOUR
TI  - Oxide Semiconductor for Advanced Memory Architectures: Atomic Layer Deposition, Key Requirement and Challenges.
AU  - Lee CH
AU  - Ryu SH
AU  - Hwang T
AU  - Kim SH
AU  - Kim YS
AU  - Park JS
PY  - 2026
JO  - Nano-micro letters
DO  - 10.1007/s40820-025-02013-7
UR  - https://doi.org/10.1007/s40820-025-02013-7
ER  - 

APA

CH, L., SH, R., T, H., SH, K., YS, K., & JS, P. (2026). Oxide Semiconductor for Advanced Memory Architectures: Atomic Layer Deposition, Key Requirement and Challenges.. Nano-micro letters. https://doi.org/10.1007/s40820-025-02013-7

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