Kinetics of the SiH3 + O2 and SiH3 + NO2 reactions

Robert W. Quandt, John F. Hershberger

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DOI: 10.1016/0009-2614(93)85564-5
Published: 1993-04
Container: Chemical Physics Letters
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/0009-2614-93-85564-5,
  title = {Kinetics of the SiH3 + O2 and SiH3 + NO2 reactions},
  author = {Robert W. Quandt and John F. Hershberger},
  year = {1993},
  journal = {Chemical Physics Letters},
  doi = {10.1016/0009-2614(93)85564-5},
  url = {https://doi.org/10.1016/0009-2614(93)85564-5}
}

RIS

TY  - JOUR
TI  - Kinetics of the SiH3 + O2 and SiH3 + NO2 reactions
AU  - Robert W. Quandt
AU  - John F. Hershberger
PY  - 1993
JO  - Chemical Physics Letters
DO  - 10.1016/0009-2614(93)85564-5
UR  - https://doi.org/10.1016/0009-2614(93)85564-5
ER  -

APA

Quandt, R. W., & Hershberger, J. F. (1993). Kinetics of the SiH3 + O2 and SiH3 + NO2 reactions. Chemical Physics Letters. https://doi.org/10.1016/0009-2614(93)85564-5

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crossref · retrieved 2026-09-27T05:57:27.261Z