Reduction of oxygen to water on cobalt-nitride thin film electrodes prepared by the reactive rf sputtering technique
- DOI
- 10.1016/0022-0728(88)80193-1
- Published
- 1988-08
- Container
- Journal of Electroanalytical Chemistry and Interfacial Electrochemistry
- Publisher
- Elsevier BV
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1016/0022-0728-88-80193-1,
title = {Reduction of oxygen to water on cobalt-nitride thin film electrodes prepared by the reactive rf sputtering technique},
author = {Masashi Azuma and Minoru Kashihara and Yoshihiro Nakato and Hiroshi Tsubomura},
year = {1988},
journal = {Journal of Electroanalytical Chemistry and Interfacial Electrochemistry},
doi = {10.1016/0022-0728(88)80193-1},
url = {https://doi.org/10.1016/0022-0728(88)80193-1}
}RIS
TY - JOUR TI - Reduction of oxygen to water on cobalt-nitride thin film electrodes prepared by the reactive rf sputtering technique AU - Masashi Azuma AU - Minoru Kashihara AU - Yoshihiro Nakato AU - Hiroshi Tsubomura PY - 1988 JO - Journal of Electroanalytical Chemistry and Interfacial Electrochemistry DO - 10.1016/0022-0728(88)80193-1 UR - https://doi.org/10.1016/0022-0728(88)80193-1 ER -
APA
Azuma, M., Kashihara, M., Nakato, Y., & Tsubomura, H. (1988). Reduction of oxygen to water on cobalt-nitride thin film electrodes prepared by the reactive rf sputtering technique. Journal of Electroanalytical Chemistry and Interfacial Electrochemistry. https://doi.org/10.1016/0022-0728(88)80193-1
Source records
- crossref · retrieved 2026-09-26T01:51:48.112Z