Chemical modification of GaPc-Cl thin film photoelectrodes

A. Nanthakumar, N.R. Armstrong

Open source

DOI
10.1016/0022-0728(88)85095-2
Published
1988-07
Container
Journal of Electroanalytical Chemistry and Interfacial Electrochemistry
Publisher
Elsevier BV
Open access
unknown

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BibTeX

@article{allodium:10.1016/0022-0728-88-85095-2,
  title = {Chemical modification of GaPc-Cl thin film photoelectrodes},
  author = {A. Nanthakumar and N.R. Armstrong},
  year = {1988},
  journal = {Journal of Electroanalytical Chemistry and Interfacial Electrochemistry},
  doi = {10.1016/0022-0728(88)85095-2},
  url = {https://doi.org/10.1016/0022-0728(88)85095-2}
}

RIS

TY  - JOUR
TI  - Chemical modification of GaPc-Cl thin film photoelectrodes
AU  - A. Nanthakumar
AU  - N.R. Armstrong
PY  - 1988
JO  - Journal of Electroanalytical Chemistry and Interfacial Electrochemistry
DO  - 10.1016/0022-0728(88)85095-2
UR  - https://doi.org/10.1016/0022-0728(88)85095-2
ER  - 

APA

Nanthakumar, A., & Armstrong, N. (1988). Chemical modification of GaPc-Cl thin film photoelectrodes. Journal of Electroanalytical Chemistry and Interfacial Electrochemistry. https://doi.org/10.1016/0022-0728(88)85095-2

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