Electrical breakdown and pitting in anodic films on tungsten in halogen ion-containing solutions

F. Di Quarto, S. Piazza, C. Sunseri

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DOI: 10.1016/0022-0728(88)85155-6
Published: 1988-06
Container: Journal of Electroanalytical Chemistry and Interfacial Electrochemistry
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/0022-0728-88-85155-6,
  title = {Electrical breakdown and pitting in anodic films on tungsten in halogen ion-containing solutions},
  author = {F. Di Quarto and S. Piazza and C. Sunseri},
  year = {1988},
  journal = {Journal of Electroanalytical Chemistry and Interfacial Electrochemistry},
  doi = {10.1016/0022-0728(88)85155-6},
  url = {https://doi.org/10.1016/0022-0728(88)85155-6}
}

RIS

TY  - JOUR
TI  - Electrical breakdown and pitting in anodic films on tungsten in halogen ion-containing solutions
AU  - F. Di Quarto
AU  - S. Piazza
AU  - C. Sunseri
PY  - 1988
JO  - Journal of Electroanalytical Chemistry and Interfacial Electrochemistry
DO  - 10.1016/0022-0728(88)85155-6
UR  - https://doi.org/10.1016/0022-0728(88)85155-6
ER  -

APA

Quarto, F. D., Piazza, S., & Sunseri, C. (1988). Electrical breakdown and pitting in anodic films on tungsten in halogen ion-containing solutions. Journal of Electroanalytical Chemistry and Interfacial Electrochemistry. https://doi.org/10.1016/0022-0728(88)85155-6

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crossref · retrieved 2026-09-26T07:00:40.167Z