Two-component diffusion and reaction in rotating disk voltammetry. Can fast kinetics force equilibration in the diffusion layer?
- DOI
- 10.1016/0022-0728(91)85508-m
- Published
- 1991-04
- Container
- Journal of Electroanalytical Chemistry and Interfacial Electrochemistry
- Publisher
- Elsevier BV
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1016/0022-0728-91-85508-m,
title = {Two-component diffusion and reaction in rotating disk voltammetry. Can fast kinetics force equilibration in the diffusion layer?},
author = {John Texter},
year = {1991},
journal = {Journal of Electroanalytical Chemistry and Interfacial Electrochemistry},
doi = {10.1016/0022-0728(91)85508-m},
url = {https://doi.org/10.1016/0022-0728(91)85508-m}
}RIS
TY - JOUR TI - Two-component diffusion and reaction in rotating disk voltammetry. Can fast kinetics force equilibration in the diffusion layer? AU - John Texter PY - 1991 JO - Journal of Electroanalytical Chemistry and Interfacial Electrochemistry DO - 10.1016/0022-0728(91)85508-m UR - https://doi.org/10.1016/0022-0728(91)85508-m ER -
APA
Texter, J. (1991). Two-component diffusion and reaction in rotating disk voltammetry. Can fast kinetics force equilibration in the diffusion layer?. Journal of Electroanalytical Chemistry and Interfacial Electrochemistry. https://doi.org/10.1016/0022-0728(91)85508-m
Source records
- crossref · retrieved 2026-09-27T01:12:45.706Z