An extended hexagon model for Cu underpotential deposition on Au(111)

M. Legault, L. Blum, Dale A. Huckaby

Open source

DOI: 10.1016/0022-0728(96)04622-0
Published: 1996-06
Container: Journal of Electroanalytical Chemistry
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/0022-0728-96-04622-0,
  title = {An extended hexagon model for Cu underpotential deposition on Au(111)},
  author = {M. Legault and L. Blum and Dale A. Huckaby},
  year = {1996},
  journal = {Journal of Electroanalytical Chemistry},
  doi = {10.1016/0022-0728(96)04622-0},
  url = {https://doi.org/10.1016/0022-0728(96)04622-0}
}

RIS

TY  - JOUR
TI  - An extended hexagon model for Cu underpotential deposition on Au(111)
AU  - M. Legault
AU  - L. Blum
AU  - Dale A. Huckaby
PY  - 1996
JO  - Journal of Electroanalytical Chemistry
DO  - 10.1016/0022-0728(96)04622-0
UR  - https://doi.org/10.1016/0022-0728(96)04622-0
ER  -

APA

Legault, M., Blum, L., & Huckaby, D. A. (1996). An extended hexagon model for Cu underpotential deposition on Au(111). Journal of Electroanalytical Chemistry. https://doi.org/10.1016/0022-0728(96)04622-0

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crossref · retrieved 2026-09-26T14:59:53.083Z