Characterization of silicon on insulator multilayers using ex situ spectroscopic ellipsometry and in situ monochromatic ellipsometry during plasma etching
- DOI
- 10.1016/0040-6090(93)90093-5
- Published
- 1993-10
- Container
- Thin Solid Films
- Publisher
- Elsevier BV
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1016/0040-6090-93-90093-5,
title = {Characterization of silicon on insulator multilayers using ex situ spectroscopic ellipsometry and in situ monochromatic ellipsometry during plasma etching},
author = {R. Greef and D.E. Gray and N.J. Dartnell and J. Zhu and S. Lynch and G.M. Crean},
year = {1993},
journal = {Thin Solid Films},
doi = {10.1016/0040-6090(93)90093-5},
url = {https://doi.org/10.1016/0040-6090(93)90093-5}
}RIS
TY - JOUR TI - Characterization of silicon on insulator multilayers using ex situ spectroscopic ellipsometry and in situ monochromatic ellipsometry during plasma etching AU - R. Greef AU - D.E. Gray AU - N.J. Dartnell AU - J. Zhu AU - S. Lynch AU - G.M. Crean PY - 1993 JO - Thin Solid Films DO - 10.1016/0040-6090(93)90093-5 UR - https://doi.org/10.1016/0040-6090(93)90093-5 ER -
APA
Greef, R., Gray, D., Dartnell, N., Zhu, J., Lynch, S., & Crean, G. (1993). Characterization of silicon on insulator multilayers using ex situ spectroscopic ellipsometry and in situ monochromatic ellipsometry during plasma etching. Thin Solid Films. https://doi.org/10.1016/0040-6090(93)90093-5
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- crossref · retrieved 2026-09-25T15:23:45.649Z