Tegal improves quality and throughout with silicon dioxide etch process

Keith Holman

Open source

DOI: 10.1016/0042-207x(88)90191-1
Published: 1988-01
Container: Vacuum
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/0042-207x-88-90191-1,
  title = {Tegal improves quality and throughout with silicon dioxide etch process},
  author = {Keith Holman},
  year = {1988},
  journal = {Vacuum},
  doi = {10.1016/0042-207x(88)90191-1},
  url = {https://doi.org/10.1016/0042-207x(88)90191-1}
}

RIS

TY  - JOUR
TI  - Tegal improves quality and throughout with silicon dioxide etch process
AU  - Keith Holman
PY  - 1988
JO  - Vacuum
DO  - 10.1016/0042-207x(88)90191-1
UR  - https://doi.org/10.1016/0042-207x(88)90191-1
ER  -

APA

Holman, K. (1988). Tegal improves quality and throughout with silicon dioxide etch process. Vacuum. https://doi.org/10.1016/0042-207x(88)90191-1

Source records

crossref · retrieved 2026-09-27T00:01:28.268Z