Resist performance in 5nm and 13nm soft X-ray projection lithography

Hiroaki Oizumi, Masayuki Ohtani, Yoshio Yamashita, Katsuhiko Murakami, Hiroshi Nagata, Nobufumi Atoda

Open source

DOI: 10.1016/0167-9317(94)00115-b
Published: 1995-02
Container: Microelectronic Engineering
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/0167-9317-94-00115-b,
  title = {Resist performance in 5nm and 13nm soft X-ray projection lithography},
  author = {Hiroaki Oizumi and Masayuki Ohtani and Yoshio Yamashita and Katsuhiko Murakami and Hiroshi Nagata and Nobufumi Atoda},
  year = {1995},
  journal = {Microelectronic Engineering},
  doi = {10.1016/0167-9317(94)00115-b},
  url = {https://doi.org/10.1016/0167-9317(94)00115-b}
}

RIS

TY  - JOUR
TI  - Resist performance in 5nm and 13nm soft X-ray projection lithography
AU  - Hiroaki Oizumi
AU  - Masayuki Ohtani
AU  - Yoshio Yamashita
AU  - Katsuhiko Murakami
AU  - Hiroshi Nagata
AU  - Nobufumi Atoda
PY  - 1995
JO  - Microelectronic Engineering
DO  - 10.1016/0167-9317(94)00115-b
UR  - https://doi.org/10.1016/0167-9317(94)00115-b
ER  -

APA

Oizumi, H., Ohtani, M., Yamashita, Y., Murakami, K., Nagata, H., & Atoda, N. (1995). Resist performance in 5nm and 13nm soft X-ray projection lithography. Microelectronic Engineering. https://doi.org/10.1016/0167-9317(94)00115-b

Source records

crossref · retrieved 2026-09-25T15:29:25.457Z