DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID device

B.J. Vleeming, J.L.T.R. Leene, E. van der Drift, J. Romijn

Open source

DOI: 10.1016/0167-9317(95)00200-6
Published: 1996-01
Container: Microelectronic Engineering
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/0167-9317-95-00200-6,
  title = {DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID device},
  author = {B.J. Vleeming and J.L.T.R. Leene and E. van der Drift and J. Romijn},
  year = {1996},
  journal = {Microelectronic Engineering},
  doi = {10.1016/0167-9317(95)00200-6},
  url = {https://doi.org/10.1016/0167-9317(95)00200-6}
}

RIS

TY  - JOUR
TI  - DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID device
AU  - B.J. Vleeming
AU  - J.L.T.R. Leene
AU  - E. van der Drift
AU  - J. Romijn
PY  - 1996
JO  - Microelectronic Engineering
DO  - 10.1016/0167-9317(95)00200-6
UR  - https://doi.org/10.1016/0167-9317(95)00200-6
ER  -

APA

Vleeming, B., Leene, J., Drift, E. V. D., & Romijn, J. (1996). DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID device. Microelectronic Engineering. https://doi.org/10.1016/0167-9317(95)00200-6

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crossref · retrieved 2026-09-26T15:20:41.417Z