In-situ IR and mass spectroscopic study of theAl(CH3)2/Ha-Si:H reaction processes

T. Wadayama, Y. Maiwa, H. Shibata, A. Hatta

Open source

DOI: 10.1016/0169-4332(96)00341-8
Published: 1996-07
Container: Applied Surface Science
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/0169-4332-96-00341-8,
  title = {In-situ IR and mass spectroscopic study of theAl(CH3)2/Ha-Si:H reaction processes},
  author = {T. Wadayama and Y. Maiwa and H. Shibata and A. Hatta},
  year = {1996},
  journal = {Applied Surface Science},
  doi = {10.1016/0169-4332(96)00341-8},
  url = {https://doi.org/10.1016/0169-4332(96)00341-8}
}

RIS

TY  - JOUR
TI  - In-situ IR and mass spectroscopic study of theAl(CH3)2/Ha-Si:H reaction processes
AU  - T. Wadayama
AU  - Y. Maiwa
AU  - H. Shibata
AU  - A. Hatta
PY  - 1996
JO  - Applied Surface Science
DO  - 10.1016/0169-4332(96)00341-8
UR  - https://doi.org/10.1016/0169-4332(96)00341-8
ER  -

APA

Wadayama, T., Maiwa, Y., Shibata, H., & Hatta, A. (1996). In-situ IR and mass spectroscopic study of theAl(CH3)2/Ha-Si:H reaction processes. Applied Surface Science. https://doi.org/10.1016/0169-4332(96)00341-8

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crossref · retrieved 2026-09-26T07:55:28.936Z