Engineering waveguide surface by gradient etching for uniform light scattering in photocatalytic applications
- DOI
- 10.1016/j.ceja.2021.100192
- Published
- 2021-11
- Container
- Chemical Engineering Journal Advances
- Publisher
- Elsevier BV
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1016/j.ceja.2021.100192,
title = {Engineering waveguide surface by gradient etching for uniform light scattering in photocatalytic applications},
author = {Xiangkun Elvis Cao and Tao Hong and Spencer Hong and David Erickson},
year = {2021},
journal = {Chemical Engineering Journal Advances},
doi = {10.1016/j.ceja.2021.100192},
url = {https://doi.org/10.1016/j.ceja.2021.100192}
}RIS
TY - JOUR TI - Engineering waveguide surface by gradient etching for uniform light scattering in photocatalytic applications AU - Xiangkun Elvis Cao AU - Tao Hong AU - Spencer Hong AU - David Erickson PY - 2021 JO - Chemical Engineering Journal Advances DO - 10.1016/j.ceja.2021.100192 UR - https://doi.org/10.1016/j.ceja.2021.100192 ER -
APA
Cao, X. E., Hong, T., Hong, S., & Erickson, D. (2021). Engineering waveguide surface by gradient etching for uniform light scattering in photocatalytic applications. Chemical Engineering Journal Advances. https://doi.org/10.1016/j.ceja.2021.100192
Source records
- crossref · retrieved 2026-09-25T05:46:20.357Z