Fluorine plasma etching modulates submicron topography, physico-chemical aging and biological responses of titanium dental implants.
- DOI
- 10.1016/j.dental.2025.12.006
- Published
- 2026 Apr
- Container
- Dental materials : official publication of the Academy of Dental Materials
- Publisher
- Not recorded
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1016/j.dental.2025.12.006,
title = {Fluorine plasma etching modulates submicron topography, physico-chemical aging and biological responses of titanium dental implants.},
author = {Rupp F and Illing B and Felde N and Xu Z and Schultheiss J and Kimmerle-Müller E and Mohammadnejad L and Krajewski S},
year = {2026},
journal = {Dental materials : official publication of the Academy of Dental Materials},
doi = {10.1016/j.dental.2025.12.006},
url = {https://doi.org/10.1016/j.dental.2025.12.006}
}RIS
TY - JOUR TI - Fluorine plasma etching modulates submicron topography, physico-chemical aging and biological responses of titanium dental implants. AU - Rupp F AU - Illing B AU - Felde N AU - Xu Z AU - Schultheiss J AU - Kimmerle-Müller E AU - Mohammadnejad L AU - Krajewski S PY - 2026 JO - Dental materials : official publication of the Academy of Dental Materials DO - 10.1016/j.dental.2025.12.006 UR - https://doi.org/10.1016/j.dental.2025.12.006 ER -
APA
F, R., B, I., N, F., Z, X., J, S., E, K., L, M., & S, K. (2026). Fluorine plasma etching modulates submicron topography, physico-chemical aging and biological responses of titanium dental implants.. Dental materials : official publication of the Academy of Dental Materials. https://doi.org/10.1016/j.dental.2025.12.006
Source records
- pubmed · retrieved 2026-09-25T22:02:04.556Z