Clustering rooting for the high heat resistance of some CHNO energetic materials

Xingyu Huo, Fanfan Wang, Liang Liang Niu, Ruijun Gou, Chaoyang Zhang

Open source

DOI: 10.1016/j.fpc.2021.02.007
Published: 03
Container: FirePhysChem
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1016/j.fpc.2021.02.007,
  title = {Clustering rooting for the high heat resistance of some CHNO energetic materials},
  author = {Xingyu Huo and Fanfan Wang and Liang Liang Niu and Ruijun Gou and Chaoyang Zhang},
  year = {2021},
  journal = {FirePhysChem},
  doi = {10.1016/j.fpc.2021.02.007},
  url = {https://doi.org/10.1016/j.fpc.2021.02.007}
}

RIS

TY  - JOUR
TI  - Clustering rooting for the high heat resistance of some CHNO energetic materials
AU  - Xingyu Huo
AU  - Fanfan Wang
AU  - Liang Liang Niu
AU  - Ruijun Gou
AU  - Chaoyang Zhang
PY  - 2021
JO  - FirePhysChem
DO  - 10.1016/j.fpc.2021.02.007
UR  - https://doi.org/10.1016/j.fpc.2021.02.007
ER  -

APA

Huo, X., Wang, F., Niu, L. L., Gou, R., & Zhang, C. (2021). Clustering rooting for the high heat resistance of some CHNO energetic materials. FirePhysChem. https://doi.org/10.1016/j.fpc.2021.02.007

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doaj · retrieved 2026-09-25T08:00:01.780Z