Temperature resistant anti-reflective coating on Si-wafer for long-wave infra-red imaging
- DOI
- 10.1016/j.heliyon.2023.e15888
- Published
- 2023-05
- Container
- Heliyon
- Publisher
- Elsevier BV
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1016/j.heliyon.2023.e15888,
title = {Temperature resistant anti-reflective coating on Si-wafer for long-wave infra-red imaging},
author = {Phillip H. Papatzacos and M. Nadeem Akram and Olivier Hector and Frédéric Lemarquis and Antonin Moreau and Julien Lumeau and Per Ohlckers},
year = {2023},
journal = {Heliyon},
doi = {10.1016/j.heliyon.2023.e15888},
url = {https://doi.org/10.1016/j.heliyon.2023.e15888}
}RIS
TY - JOUR TI - Temperature resistant anti-reflective coating on Si-wafer for long-wave infra-red imaging AU - Phillip H. Papatzacos AU - M. Nadeem Akram AU - Olivier Hector AU - Frédéric Lemarquis AU - Antonin Moreau AU - Julien Lumeau AU - Per Ohlckers PY - 2023 JO - Heliyon DO - 10.1016/j.heliyon.2023.e15888 UR - https://doi.org/10.1016/j.heliyon.2023.e15888 ER -
APA
Papatzacos, P. H., Akram, M. N., Hector, O., Lemarquis, F., Moreau, A., Lumeau, J., & Ohlckers, P. (2023). Temperature resistant anti-reflective coating on Si-wafer for long-wave infra-red imaging. Heliyon. https://doi.org/10.1016/j.heliyon.2023.e15888
Source records
- crossref · retrieved 2026-11-09T10:49:24.638Z